On the Origins of Oxidation-Induced Stacking Faults in Silicon

Journal of the Electrochemical Society

Volumn 146, Issue 2, 1999, Pages 741-743

  Monson, T K ^a   Van Vechten, J A ^b  

^a Columbia American Plating Company ^*  (United States)

^b Oregon State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; DISLOCATIONS (CRYSTALS); NUCLEATION; STACKING FAULTS;

OXIDATION-INDUCED STACKING FAULTS (OSF); VACANCY ANNIHILATION;

SEMICONDUCTING SILICON;

EID: 0033076458     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391673     Document Type: Article

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