Effect of repeated Ar+ bombardment on structure and properties of PCVD thin films

Surface and Coatings Technology

Volumn 112, Issue 1-3, 1999, Pages 236-239

  Xie, F ^a   Yuan, J W ^a   Xu, K W ^a   He, J W ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Ar+ bombardment; PCVD; Property; Structure; Titanium nitride

Indexed keywords

ARGON; BOND STRENGTH (MATERIALS); CHLORINE; DENSITY (SPECIFIC GRAVITY); HARDNESS; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS; WEAR RESISTANCE;

DIRECT-CURRENT CHEMICAL VAPOR DEPOSITION;

TITANIUM NITRIDE;

EID: 0033075770     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00741-5     Document Type: Article

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