Spatially resolved electron density distribution in an RF excited parallel plate plasma reactor by 1 mm microwave interferometry

Plasma Sources Science and Technology

Volumn 8, Issue 1, 1999, Pages 94-99

  Lukas, Ch ^a   Muller M ^a   Schulz Von Der Gathen, V ^a   Dobele H F ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRODES; ELECTRON DENSITY MEASUREMENT; INTERFEROMETRY; MICROWAVE MEASUREMENT;

ABEL INVERSION; PARALLEL PLATE PLASMA REACTORS;

PLASMA DEVICES;

EID: 0033075647     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/1/012     Document Type: Article

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