An intelligent supervisory system for ion implantation in IC fabrication processes

Control Engineering Practice

Volumn 7, Issue 2, 1999, Pages 241-247

  Shen, Li Cheng ^a   Hsu, Pau Lo ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Beam maps; Feature extraction; Fuzzy expert systems; Ion implantation; Supervision; Symptom analysis

Indexed keywords

EXPERT SYSTEMS; FEATURE EXTRACTION; FUZZY CONTROL; INTEGRATED CIRCUIT MANUFACTURE; INTERFACES (COMPUTER); ION IMPLANTATION; MATHEMATICAL MODELS; ONLINE SYSTEMS; REAL TIME SYSTEMS; SCANNING; TWO DIMENSIONAL;

ANALOG IMAGE SIGNALS; BEAM SCANNING; INTELLIGENT SUPERVISORY SYSTEM; ONLINE DIAGNOSIS;

SCADA SYSTEMS;

EID: 0033075516     PISSN: 09670661     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0967-0661(98)00162-2     Document Type: Article

References (7)

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2. Dykstra, J.P. (1987). Semiconductor ion implantation equipment, applications, and process consideration, Technical publications 87.2 (pp. 1-19). Eaton Corporation. TX, USA: Semiconductor Equipment Division.
3. Eaton Corporation (1992). Eaton NV-6200 A/AV ion implantation system technical reference manual. Eaton Corporation. TX, U.S.A. Semiconductor Equipment Division.
4. Myron, D.D., & Zrudsky, D.R. (1987). Implant uniformity improvement using advanced scanning techniques. Nucl. Instr. Meth. Phys. Res. B21, 410-413.
5. Negoita, C.V. (1985). Expert systems and fuzzy systems. CA, USA: The Benjamin/Cummings Publishing Company.
6. Rose, P.H. (1985). A history of commercial implantation. Nucl. Instr. and Meth. Phys. Res. B6, 1-8.
7. Shen, L.C. (1998). The intelligent supervision system for the ion implantation process. Ph.D. thesis, Dept. Electrical and Control Engineering, National Chiao-Tung University, Hsin-Chu, Taiwan, ROC.