Study on Interfacial Reaction of Ti/AlN by SIMS, RBS and XRD

Surface and Interface Analysis

Volumn 27, Issue 2, 1999, Pages 98-102

  Yue, Ruifeng ^a,b   Wang, Yan ^c   Wang, Youxiang ^b   Chen, Chunhua ^b  

^a TSINGHUA UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c XI'AN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

AlN; Interfacial reaction; RBS; SIMS; Ti

Indexed keywords

ALUMINUM COMPOUNDS; ANNEALING; CERAMIC MATERIALS; DEPOSITION; ELECTRON BEAMS; ION BOMBARDMENT; METALLIC FILMS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SURFACE CHEMISTRY; TITANIUM; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NITRIDE;

INTERFACES (MATERIALS);

EID: 0033075430     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199902)27:2<98::AID-SIA476>3.0.CO;2-1     Document Type: Article

References (13)

1. F. Miyashiyo, N. Iwase, A. Tsuge, et al., IEEE Trans. CHMT 13, 313 (1990).
2. T. Yasumoto, K. Yamakawa and N. Iwase, J. Ceram. Soc. Jpn. Int. Ed. 101, 944 (1993).
3. W. B. Carter and M. V. Papageorge, J. Vac. Sci. Technol. 10A, 3460 (1992).
4. R. K. Brow, R. E. Loehaman and A. P. Tomsia, Adv. Ceram. 26, 189 (1989).
5. A. P. Tomsia and R. E. Loehman, Mater. Manuf. Process. 9, 547 (1994).
6. M. G. Norton, J. M., Kajda and B. C. H. Steele, J. Mater. Res. 5, 2172 (1990).
7. A. H. Carim and R. E. Loehman, J. Mater. Res. 15, 1520 (1990).
8. R. F. Vue, Y. X. Wang and C. H. Chen, Vac. Sci. Technol. 17, 208 (1997) (in Chinese).
9. W. K. Chu, J. W. Mayer and M. A. Nicolet, Backscattering Spectrometry. Academic Press, New York (1978).
10. I. Barin, Thermochemical Data of Pure Substances. VCH Verlagsgellschaft, Weinheim, Germany (1993).
11. R. Beyers, R. Sinclair and M. E. Thomas, J. Vac. Sci. Technol. 2B, 781 (1984).
12. A. S. Bhansali, R. Sinclair and A. E. Morgan, J. Appl. Phys. 68, 1043 (1990).
13. Z. H. Li, Handbook of Element Properties. Hebei People's Publishing House, China (1995).