Adsorption removal of copper(II) using chitosan from simulated rinse solutions containing chelating agents

Water Research

Volumn 33, Issue 10, 1999, Pages 2403-2409

  Juang, Ruey Shin ^a   Wu, Feng Chin ^b   Tseng, Ru Ling ^b  

^a YUAN ZE UNIVERSITY   (Taiwan)

^b NATIONAL UNITED UNIVERSITY   (Taiwan)

Author keywords

Adsorption; Chelating agents; Chitosan; Copper ions; Isotherm; Rinse solution

Indexed keywords

ADSORPTION; COPPER; ELECTROSTATICS; IONS; ISOTHERMS; NUMERICAL METHODS; ORGANIC ACIDS; PH; SODIUM COMPOUNDS;

CHELATING AGENTS; CHITOSAN; CITRIC ACID; ETHYLENEDIAMINETETRAACETIC ACID; RINSE SOLUTIONS; SODIUM GLUCONATE; TARTARIC ACID;

SOLUTIONS;

CHELATING AGENT; CHITOSAN; CITRIC ACID; COPPER ION; EDETIC ACID; SODIUM HYDROXIDE; TARTARIC ACID;

WASTEWATER;

ADSORPTION; ARTICLE; PH; PRIORITY JOURNAL; SOLUTION AND SOLUBILITY; WATER TREATMENT;

EID: 0033047227     PISSN: 00431354     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0043-1354(98)00469-2     Document Type: Article

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