Flow injection determination of bromide ion in a developer using bromide ion-selective electrode detector

Talanta

Volumn 50, Issue 3, 1999, Pages 595-600

  Masadome, Takashi ^a   Asano, Yasukazu ^b   Nakamura, Takashi ^c  

^a National Institute of Technology Ariake College   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

^c FUJIFILM CORPORATION   (Japan)

Author keywords

Bromide ion; Bromide selective electrode detector; Developer; Flow injection analysis

Indexed keywords

BROMIDE; ION;

ARTICLE; FILM; FLOW INJECTION ANALYSIS; ION SELECTIVE ELECTRODE; PHOTOGRAPHY; POTENTIOMETRY;

EID: 0032884650     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-9140(99)00147-2     Document Type: Article

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