Photochemical fine particle formation in the gas phase from acrolein by a two-photon process

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 153, Issue 1-3, 1999, Pages 203-207

  Morita, Hiroshi ^a   Semba, Katsuhiko ^a   Umezawa, Takeshi ^a   Kuwamura, Makoto ^a  

^a CHIBA UNIVERSITY   (Japan)

Author keywords

Acrolein; Formaldehyde; N2 laser induced aerosol particle formation; Sensitization of nucleation; Vinyltrimethoxysilane

Indexed keywords

AEROSOLS; FORMALDEHYDE; GAS LASERS; HELIUM NEON LASERS; LIGHT SCATTERING; MONOMERS; MULTIPHOTON PROCESSES; ORGANIC POLYMERS; PARTICLES (PARTICULATE MATTER); SILICON COMPOUNDS;

ACROLEIN; NITROGEN LASER; VINYLTRIMETHOXYSILANE;

PHOTOPOLYMERIZATION;

ACROLEIN;

AEROSOL; CONFERENCE PAPER; GAS; IN VITRO STUDY; PHOTOCHEMISTRY; POLYMERIZATION; PRESSURE; PRIORITY JOURNAL; REACTION ANALYSIS;

EID: 0032811454     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(98)00443-9     Document Type: Conference Paper

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