Macrocrystalline silicon thin films for optical applications

Vacuum

Volumn 52, Issue 1-2, 1999, Pages 67-71

  Vieira, M ^a   Morgado, E ^b   Macarico A ^a   Koynov, S ^c   Schwarz, R ^b  

^a INSTITUTO SUPERIOR DE ENGENHARIA DE LISBOA   (Portugal)

^b INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^c BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELECTRIC NETWORK ANALYSIS; ELECTRIC POTENTIAL; IMAGE SENSORS; OHMIC CONTACTS; OPTICAL FILMS; OPTICAL SENSORS; PHOTODETECTORS; PHOTOVOLTAIC EFFECTS; SILICON SENSORS; THIN FILM DEVICES;

IMAGE DETECTORS; PHOTOVOLTAGE;

SEMICONDUCTING FILMS;

EID: 0032804888     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00216-4     Document Type: Article

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