Surface characterization in the silicon cleaning process by a-UPC; Atmospheric ultraviolet photoelectron counting

Solid State Phenomena

Volumn 65-66, Issue , 1999, Pages 203-206

  Kozuki, Y ^a   Nakajima, Y ^b   Sato, T ^c   Kinoshita, K ^a   Tsunoda, T ^d  

^a Smieie SEZ   (Japan)

^b Rikken Keiki Co Ltd   (Japan)

^c FUJITSU LABORATORIES LTD   (Japan)

^d Department of Clinical Laboratory Sciences   (Japan)

Author keywords

Ozonized water; Photoelectron; Spin process

Indexed keywords

SURFACE CLEANING; SURFACE PROPERTIES; ULTRAVIOLET RADIATION;

ATMOSPHERIC ULTRAVIOLET PHOTOELECTRON COUNTING (A-UPC);

SILICON WAFERS;

EID: 0032784359     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.65-66.203     Document Type: Conference Paper

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