A process using uzonated water solutions to remove photoresist after metallization

Solid State Phenomena

Volumn 65-66, Issue , 1999, Pages 287-290

  Nelson, S L ^a   Carter, L E ^a  

^a FSI International   (United States)

Author keywords

Aluminum; Ozone; Photoresist strip

Indexed keywords

ALUMINUM; AMMONIUM BICARBONATE; OZONE; PHOTORESISTS; SILICON WAFERS; AMMONIUM COMPOUNDS; METALLIZING; SURFACE CLEANING;

ALUMINUM (AL); OPTIMAL PROCESS; PHOTORESIST REMOVAL; PHOTORESIST STRIP; SILICON SUBSTRATES; WAFER SURFACE; WATER SOLUTIONS;

CHEMICALS REMOVAL (WATER TREATMENT); SILICON WAFERS;

AMMONIUM BICARBONATE;

EID: 0032776715     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.65-66.287     Document Type: Conference Paper

References (2)

1. J. Hoigne and H. Bader, “The Role of Hydroxyl Radical Reactions in Ozonation Processes in Aqueous Solutions”, Water Res., 10, (1976), p. 377-386.
2. L. Foni, D. Bahnemann, and Edwin J. Hart, “Mechanism of Hydroxide Ion Initiated Decomposition of Ozone in Aqueous Solution”, J. Phys. Chem., 86, (1982), p. 255-259.