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Volumn 84, Issue 1-4, 1999, Pages 495-498
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Choice of the most appropriate thermal treatment in optical dating of quartz
a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
SILICON DIOXIDE;
CONFERENCE PAPER;
RADIATION DOSE;
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EID: 0032767096
PISSN: 01448420
EISSN: None
Source Type: Journal
DOI: 10.1093/oxfordjournals.rpd.a032784 Document Type: Conference Paper |
Times cited : (6)
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References (10)
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