Mechanism of film formation on nickel anodes in a molten NH4F·2HF

Electrochimica Acta

Volumn 44, Issue 11, 1999, Pages 1761-1769

  Tasaka, A ^a   Tsukuda, Y ^a   Yamada, S ^a   Matsushita, K ^a   Kohmura, A ^a   Muramatsu, N ^a   Takebayashi, H ^a   Mimaki, T ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

Corrosion; Electrochemical fluorination; Molten fluoride; Nickel anode; Oxidized layer

Indexed keywords

ANODES; ANODIC OXIDATION; CURRENT DENSITY; DEGRADATION; ELECTROLYSIS; FILM GROWTH; HALOGENATION; MOLTEN MATERIALS; NICKEL; NICKEL COMPOUNDS; POLARIZATION; REACTION KINETICS;

ELECTROCHEMICAL FLUORINATION; NICKEL FLUORIDE; NICKEL OXIDE; NICKEL OXYFLUORIDE;

AMMONIUM COMPOUNDS;

EID: 0032761795     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(98)00335-1     Document Type: Article

References (7)

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