Post CMP cleaning using a novel HF compatible high power magasonic tank

Solid State Phenomena

Volumn 65-66, Issue , 1999, Pages 169-172

  Tardif, F ^a   Lardin, T ^a   Constant, I ^a   Fayolle, M ^a   Boelen, P ^b   Cowache, C ^b   Kashkoush, I ^b   Novak, R ^b  

^a CEA LETI   (France)

^b SubMicron Systems Inc   (United States)

Author keywords

Backend; Cleaning; CMP; HF; Megasonics

Indexed keywords

HAFNIUM; TANKS (CONTAINERS); HYDROFLUORIC ACID; MICROELECTRONICS;

BACKEND; HIGH POWER; MEGASONICS; POST-CMP CLEANING; RESIDUAL PARTICLES;

CLEANING; SURFACE CLEANING;

CHEMICAL MECHANICAL PLANARIZATION (CMP); HIGH POWER MEGASONIC TANKS;

EID: 0032761396     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.65-66.169     Document Type: Conference Paper

References (3)

1. F. Tardif, J. Palleau, T. Lardin, O. Demoliens, A. Vincent, J. Torres, E-MRS Strasbourg 1996
2. F. Tardif, I. Constant, T. Lardin, O. Demolliens, M. Fayolie, Y. Gobil, J. Palleau, J. Torres, MAM’S 97, Villard de lans (F) 1997
3. I. Constant, S. Marthon, T. Lardin, C. David, M.N. Jacquemond and F. Tardif, ECS fall meeting, Paris, Sept. 1997