Evaluation of cleaning recipes based on ozonated water for pre-gate oxide cleaning

Solid State Phenomena

Volumn 65-66, Issue , 1999, Pages 119-122

  Jeon, J S ^a   Ogle, B ^a   Baeyens, M ^b   Mertens, P ^b  

^a ADVANCED MICRO DEVICES   (United States)

^b IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); CAPACITORS; IMPURITIES; WATER;

CLEANING EFFICIENCY; CLEANING PROCESS; GATE OXIDE; OZONATED WATER; THIN GATE OXIDES;

CLEANING; SURFACE CLEANING;

OZONATED WATER; PRE-GATE OXIDE CLEANING;

EID: 0032761344     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.65-66.119     Document Type: Conference Paper

References (4)

1. I. I. Kashkoush, R. Matthews, and R. E. Novak, Photoresist Stripping using Ozone/Deionized Water Chemistry, PV 97-75, p. 471, The Electrochemical Society, 1997.
2. C. Kcncns, S. De. Gendt, D. M. Knotter, L. M. Loewenstein, M. Meuris, W. Vandervorst, and M. M. Heyns, Efficiency of Ozonatcd 01 Water in Removing Organic Contamination, PV 97-75, p. 247, The Electrochemical Society, 1997.
3. T. Osaka, A. Okamoto, H. Kumiyasu, and T. Hattori, Contamination Removal by Single- Wafer Spin Cleaning with Repetitive Use of Ozonized Water and Dilute HF, PV 97-75, p. 256, The Electrochemical Society, 1997.
4. Y. Fukazawa, K. Miyazaki, and Y. Ogawa, Direct Replacement Cleaning Technology based on Ozonated Water using a Single Processing Tank, PV 97-75, p. 264, The Electrochemical Society, 1997.