Particle removal efficiency and silicon roughness in HF-DIW/O3/megasonics cleaning

Solid State Phenomena

Volumn 65-66, Issue , 1999, Pages 27-30

  Alessandri, M ^a   Bellandi, E ^a   Pipia, F ^a   Cazzaniga, F ^a   Wolke, K ^b   Schenkl, M ^b  

^a STMICROELECTRONICS   (Italy)

^b STEAG Microtech   (Germany)

Author keywords

HF; Ozone; Removal efficiency

Indexed keywords

AMMONIA; EFFICIENCY; HAFNIUM; OZONE; SILICON; SURFACE ROUGHNESS; HYDROGEN PEROXIDE; OXYGEN; SURFACE CLEANING;

CHEMICAL CONSUMPTION; HF CHEMISTRY; MEGASONICS; PARTICLE ADDITION; PARTICLE REMOVAL EFFICIENCY; REMOVAL EFFICIENCIES; ROUGHENING EFFECTS;

CLEANING; SILICON WAFERS;

MEGASONICS CLEANING;

EID: 0032761009     PISSN: 10120394     EISSN: 16629779     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/SSP.65-66.27     Document Type: Conference Paper

References (5)

1. M. Mcuris, M. Heyns, The Imec Cleaning Concept, Proc. of 2nd Int. Symp UCPSS, Brugges, Belgium (1994)
2. F. Tardif, T. Lardin, P. Boelen, R. Novak, I. Kashkoush, Diluted dynamic clean: “DDC", Proc. of 3rd Int. Symp UCPSS, Antwerp, Belgium (1996)
3. T. Kujime, Y. Nishiyama, S. Okan, T. Ohmi, in Proc. of 3nl Int. Symp UCPSS, Antwerp, Belgium (1996).
4. E. Bellandi, M. Alessandri, A. Tonti, F. Pipia, K. Wolke, M. Schenkl. M. Geomini, L.F. Tzkwakman, in Proc. of Optimisation of etching uniformity and repeatability in diluted HF192nd ECS meeting. Pans (1991)
5. M. Alessandri, E. Bellandi. B. Crivelli, F. Pipia, K. Wolke, M. Schenkl, Particle Removal Efficiency of diluted I IF Solutions, in Proc. of 192nd ECS meeting, Paris (1997)