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Volumn , Issue , 1999, Pages 100-105
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IC layout and manufacturability: Critical links and design flow implications
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL POLISHING;
CMOS INTEGRATED CIRCUITS;
OPTIMIZATION;
VLSI CIRCUITS;
CHEMICAL MECHANICAL POLISHING (CMP);
OPTICAL PROXIMITY CORRECTION (OPC);
INTEGRATED CIRCUIT LAYOUT;
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EID: 0032741288
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/icvd.1999.745132 Document Type: Conference Paper |
Times cited : (3)
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References (51)
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