Matrix isolation and photochemistry of tetrafluoro-p-xylylene

European Journal of Organic Chemistry

Volumn , Issue 12, 1999, Pages 3287-3290

  Wenk, Hans Henning ^a   Sander, Wolfram ^a   Leonov, Andrei ^b   De Meijere, Armin ^b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b UNIVERSITY OF GÖTTINGEN   (Germany)

Author keywords

Cyclophanes; Matrix isolation; Parylene AF 4; Photochemical reactions; Quinodimethanes

Indexed keywords

CYCLOALKENE; FLUORINE DERIVATIVE;

ARTICLE; CHEMICAL MODIFICATION; CHEMICAL STRUCTURE; PHOTOCHEMISTRY; PYROLYSIS; SPECTRAL SENSITIVITY; TEMPERATURE DEPENDENCE;

EID: 0032735257     PISSN: 1434193X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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