Surface photovoltage measurement of hydrogen-treated Si surfaces

Journal of the Electrochemical Society

Volumn 146, Issue 1, 1999, Pages 292-295

  Nauka, K ^a   Kamins, T I ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HYDROFLUORIC ACID; HYDROGEN; OXIDATION; OXIDES; PASSIVATION; SEMICONDUCTOR GROWTH; SURFACE MEASUREMENT; SURFACE TREATMENT; VOLTAGE MEASUREMENT;

CONTACTLESS SURFACE PHOTOVOLTAGE TECHNIQUE;

SILICON WAFERS;

EID: 0032732932     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1391602     Document Type: Article

References (4)

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