Ion implantation and anneal to produce low resistance metal-diamond contacts

Diamond and Related Materials

Volumn 8, Issue 10, 1999, Pages 1936-1943

  Brandes, G R ^a   Beetz, C P ^a   Feger, C F ^a   Wright, R W ^a   Davidson, J L ^b  

^a Advanced Technology Materials Inc   (United States)

^b VANDERBILT UNIVERSITY   (United States)

Author keywords

Contacts; Diamond; Ion implantation

Indexed keywords

ANNEALING; BORON; COMPOSITION EFFECTS; DIAMONDS; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; ELECTRIC RESISTANCE; GOLD; ION IMPLANTATION; SILICON; THERMAL EFFECTS; TITANIUM;

SPECIFIC CONTACT RESISTANCE;

ELECTRIC CONTACTS;

EID: 0032692054     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00161-2     Document Type: Article

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