Development of total support CAD system for alternate-type PSMs with optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 222-232

  Haruki, Tamae ^a   Tsujimura, Ryo ^a   Tomida, Junji ^a   Machida, Yasuhide ^a   Asai, Satoru ^a   Hanyu, Isamu ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; PARALLEL PROCESSING SYSTEMS; PHASE SHIFT; SEMICONDUCTOR DEVICE MANUFACTURE;

OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFT MASKS (PSM); TOTAL SUPPORT COMPUTER AIDED DESIGN (CAD) SYSTEMS;

MASKS;

EID: 0032691247     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (4)