Ultra-thin zeolite films through simple self-assembled processes

Advanced Materials

Volumn 11, Issue 6, 1999, Pages 497-499

  Cho, Gyoujin ^a   Lee, Jae Suk ^b   Glatzhofer, Daniel T ^c   Fung, Bing M ^c   Yuan, Wei Lei ^c   O'Rear, Edgar A ^c  

^a Sunchon National University   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c UNIVERSITY OF OKLAHOMA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BROWNIAN MOVEMENT; CARBOXYLIC ACIDS; COAGULATION; COLLOID CHEMISTRY; ELECTROLYTES; ELECTROSTATICS; HYDROPHOBICITY; NANOSTRUCTURED MATERIALS; SURFACE ACTIVE AGENTS; ULTRATHIN FILMS; VAN DER WAALS FORCES;

HEXANOIC ACID; PERIKINETIC PHENOMENA;

ZEOLITES;

EID: 0032690131     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-4095(199904)11:6<497::AID-ADMA497>3.0.CO;2-Z     Document Type: Article

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