Error evaluation technique for the angle of incidence in a rotating element ellipsometer using a quartz crystal

Journal of Physics D: Applied Physics

Volumn 32, Issue 17, 1999, Pages 2246-2249

  Chao, Y F ^a   Wang, M W ^a   Ko, Z C ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC FIELDS; ERROR ANALYSIS; LIGHT REFLECTION; QUARTZ APPLICATIONS;

ROTATING ELEMENT ELLIPSOMETERS;

ELLIPSOMETRY;

EID: 0032690013     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/17/315     Document Type: Article

References (13)

1. Beatie J R 1955 Phil. Mag. 46 235
2. Taft E A and Philipp H R 1965 Phys. Rev. A 138 197
3. Tomaselli V P, Rivera R, Edeweard D C and Moeller K D 1981 Appl. Opt. 20 3961
4. Stagg B J and Charalampopoulos T T 1991 Appl. Opt. 30 4113
5. Azzam R M A and Bashara N M 1992 Ellipsometry and Polarized Light (Amsterdam: North-Holland)
6. Alonso M I and Garriga M 1995 Appl. Phys. Lett. 67 596
7. Collins R W 1990 Rev. Sci. Instrum. 61 2029
8. Zeidler J R, Kohles R B and Bashara N M 1974 Appl. Opt. 13 1938
9. McCrankin F L, Passaglia E, Stromberg R R and Steinberg H L 1963 J. Res. Natl Bur. Stand. A 67 363
10. Chao Y F, Wei C S, Lee W C, Lin S C and Chao T S 1995 Japan. J. Appl. Phys. 34 5016
11. Lekner J 1991 J. Phys.: Condens. Matter 3 6121
12. Chao Y F, Lee W C, Hung C S and Lin J J 1998 J. Phys. D: Appl. Phys. 31 1968
13. Aspnes D E 1980 J. Opt. Soc. Am. 70 1275