Characterization of charges in fluorinated polyimide film with different thermal history by using capacitance-voltage methods

Materials Research Bulletin

Volumn 34, Issue 6, 1999, Pages 869-876

  Lee, Y K ^a   Murarka, S P ^b  

^a SCHOOL OF APPLIED SCIENCE   (Singapore)

^b Rensselaer Polytechnic Institute   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE; CAPACITORS; DIELECTRIC PROPERTIES OF SOLIDS; ELECTRIC POTENTIAL; FLUORINE CONTAINING POLYMERS; POLYIMIDES; SEMICONDUCTING FILMS; SEMICONDUCTING POLYMERS; THIN FILMS;

BIAS TEMPERATURE STRESS (BTS) TECHNIQUE; CAPACITANCE-VOLTAGE CHARACTERISTICS;

PLASTIC FILMS;

EID: 0032689842     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(99)00085-9     Document Type: Article

References (9)

1. B.C. Auman, in Low-Dielectric Thin Films for Microelectronics Applications, Materials Research Society Symposium Proceedings Vol. 381, pp. 19-29, Materials Research Society, Pittsburgh, PA (1995).
2. Y.K. Lee and S.P. Murarka, Study on hysteresis behavior on capacitance-voltage curve characteristics of fluorinated polyimide film, J. Mater. Sci. Lett., in press.
3. Sze S.M. Physics of Semiconductor Devices. 1981;John Wiley and Sons, New York.
4. Nicollian E.M., Brews J.R. MOS Physics and Technology. 1982;John Wiley and Sons, New York.
5. Seymour R.B., Carraher C.E. Jr. Polymer Chemistry. 1988;Marcel Dekker, New York.
6. Rosen S.L. Fundamental Principles of Polymeric Materials. 1982;John Wiley and Sons, New York.
7. Lee Y.K., Murarka S.P. J. Mater. Sci. 33:1998;5423.
8. Y.K. Lee, Ph.D. Thesis, Rensselaer Polytechnic Institute, 1996.
9. Lee Y.K., Murarka S.P. J. Mater. Sci. 33:1998;4105.