X-ray photoelectron spectroscopy analysis of Mo metal surface exposed to sulfate-reducing bacteria

Surface and Interface Analysis

Volumn 27, Issue 4, 1999, Pages 230-235

  Chen, G ^a,b   Clayton, C R ^a  

^a STONY BROOK UNIVERSITY   (United States)

^b Vapor Technologies Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACTERIA; BIOFILMS; CORROSION RESISTANCE; HYDROCHLORIC ACID; HYDROGEN SULFIDE; MOLYBDENUM; PITTING; POLARIZATION; PROTEINS; REDUCTION; SOLUBILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

SULFATE-REDUCING BACTERIA (SRB);

METALLIC FILMS;

EID: 0032689454     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199904)27:4<230::AID-SIA548>3.0.CO;2-U     Document Type: Article

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