Crack initiation in machining monocrystalline silicon

CIRP Annals - Manufacturing Technology

Volumn 48, Issue 1, 1999, Pages 81-84

  Inamura, T ^a   Shimada, S ^b   Takezawa, N ^a   Ikawa, N ^b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BRITTLENESS; COMPUTER SIMULATION; CRACK INITIATION; CRYSTAL DEFECTS; MATHEMATICAL MODELS; METAL CUTTING; MOLECULAR DYNAMICS; SILICON; STRESS CONCENTRATION;

DEFECT INITIATION PROCESS; GLOBAL DYNAMIC STRESS; MONOCRYSTALLINE SILICON;

MACHINING;

EID: 0032689334     PISSN: 00078506     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0007-8506(07)63136-9     Document Type: Article

References (9)

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