Ion beam analysis of PZT thin films

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 422-427

  Watamori, Michio ^a   Isono, Motoshi ^a   Madono, Hiroyuki ^a   Kawano, Yuichi ^a   Sasabe, Kaoru ^b   Hirao, Takashi ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

^b Ion Engineering Research Institute   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; FERROELECTRIC MATERIALS; FILM PREPARATION; HYSTERESIS; ION BEAMS; OXYGEN; PARTIAL PRESSURE; PERMITTIVITY; SPUTTERING; X RAY DIFFRACTION ANALYSIS;

DEPTH PROFILING OF OXYGEN; HELICON SPUTTERING METHOD; ION BEAM ANALYSIS; LEAD ZIRCONIA TITANATE; RESONANT BACKSCATTERING;

SEMICONDUCTING LEAD COMPOUNDS;

EID: 0032686769     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00681-3     Document Type: Article

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