Vapor deposition of parylene-F using hydrogen as carrier gas

Journal of Materials Research

Volumn 14, Issue 1, 1999, Pages 246-250

  Mathur, D ^a,c   Yang, G R ^b   Lu, T M ^b  

^a Rensselaer Polytechnic Institute   (United States)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c GENERAL ELECTRIC COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; AROMATIC POLYMERS; CRYSTAL MICROSTRUCTURE; DIMERS; FLUORINE CONTAINING POLYMERS; HYDROGEN; MICROELECTRONIC PROCESSING; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; VAPOR DEPOSITION;

GORHAM DIMER METHOD; LIQUID PRECURSOR METHOD; PARYLENE;

PLASTIC FILMS;

EID: 0032686741     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0036     Document Type: Article

References (8)

1. W. F. Gorham (to Union Carbide Corp.), US Patent No. 3,342,754 (19 September 1967).
2. W. F. Gorham and J. T. C. Yeh, J. Org. Chem. 34, 2366 (1965);
3. W. F. Gorham, J. Poly. Sci., Pt. A-1 4, 3027 (1966).
4. L. You, G-R. Yang, C-I. Lang, T-M. Lu, J. A. Moore, and J. F. P. McDonald, U.S. Patent 5,268,202, Dec. 7, 1993.
5. C. P. Wong, Polymers for Electronic and Photonic Applications (Academic Press, San Diego, CA, 1993);
6. T-M. Lu, S. Murarka, T. S. Kuan, and C. Ting, Low-Dielectric Constant Materials: Synthesis and Applications in Microelectronics, edited by T-M. Lu, S. P. Murarka, T. S. Kuan, and C. H. Ting (Mater. Res. Soc. Symp. Proc. 381, Pittsburgh, PA, 1995).
7. T-M. Lu, J. F. McDonald, S. Dabral, G-R. Yang, L. You, and P. Bai, in Advanced Metallizations in Microelectronics, edited by A. Katz, S. P. Murarka, and A. Appelbaum (Mater. Res. Soc. Symp. Proc. 181, Pittsburgh, PA, 1990), p. 55.
8. P. K. Wu, G-R. Yang, L. You, D. Mathur, A. Cocoziello, C-I. Lang, J. A. Moore, T-M. Lu, and H. Bakhru, J. Elec. Mater. 25, 1778 (1996).