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Volumn 46, Issue 7, 1999, Pages 1355-1362

Effects of Flash EEPROM floating gate morphology on electrical behavior of fast programming bits

Author keywords

[No Author keywords available]

Indexed keywords

FLASH MEMORY;

EID: 0032686527     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.772476     Document Type: Article
Times cited : (14)

References (11)
  • 1
    • 85036499958 scopus 로고
    • A novel cell structure for a 3 volt operation, sector erase flash memory
    • H. Onoda et al., "A novel cell structure for a 3 volt operation, sector erase flash memory," in IEDM Tech. Dig., 1992, pp. 599-602.
    • (1992) IEDM Tech. Dig. , pp. 599-602
    • Onoda, H.1
  • 5
    • 0023553867 scopus 로고
    • Corner-field induced drain leakage in thin oxide MOSFET's
    • C. Chang and J. Lien, "Corner-field induced drain leakage in thin oxide MOSFET's," in IEDM Tech. Dig., 1987, p. 714.
    • (1987) IEDM Tech. Dig. , pp. 714
    • Chang, C.1    Lien, J.2
  • 9
    • 0024705114 scopus 로고
    • Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation
    • P. Heremans, J. Witters, G. Groeseneken, and H. E. Maes, "Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation," IEEE Trans. Electron Devices, vol. 36, p. 1318, 1989.
    • (1989) IEEE Trans. Electron Devices , vol.36 , pp. 1318
    • Heremans, P.1    Witters, J.2    Groeseneken, G.3    Maes, H.E.4
  • 11
    • 33749770747 scopus 로고
    • The role of electron trap creation in enhanced hot-carrier degradation during A-C stress
    • May
    • K. Mistry and B. Doyle, "The role of electron trap creation in enhanced hot-carrier degradation during A-C stress," IEEE Electron Device Lett., vol. EDL-8, p. 234-236, May 1987.
    • (1987) IEEE Electron Device Lett. , vol.EDL-8 , pp. 234-236
    • Mistry, K.1    Doyle, B.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.