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Volumn , Issue , 1999, Pages 356-361
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UV-blocking technology to reduce plasma-induced transistor damage in ferroelectric devices with low hydrogen resistance
a
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Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
FERROELECTRIC DEVICES;
GATES (TRANSISTOR);
HEAT RESISTANCE;
MATHEMATICAL MODELS;
PHOTONS;
SEMICONDUCTOR PLASMAS;
SEMICONDUCTOR STORAGE;
ULSI CIRCUITS;
ULTRAVIOLET RADIATION;
ELECTRON EXCITATION;
FERROELECTRIC MEMORY DEVICE;
HYDROGEN RESISTANCE;
PLASMA INDUCED DAMAGE;
ULTRAVIOLET LIGHT BLOCKING TECHNOLOGY;
INTEGRATED CIRCUIT MANUFACTURE;
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EID: 0032684508
PISSN: 00999512
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
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Times cited : (2)
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References (8)
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