Surface resistance of Ei-2212 films fabricated by multitarget sputtering

IEEE Transactions on Applied Superconductivity

Volumn 9, Issue 2 PART 2, 1999, Pages 2183-2186

  Otsuka, Jun ^a,b   Ohbayashi, Kazushige ^a,b   Sugihara, Yasuaki ^a,b   Senzaki, Toshio ^a,b   Yoshida, Masato ^a,b   Inoue, Masumi ^a,b   Fujimaki, Akira ^a,b  

^a NGK SPARK PLUG CO LTD   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BISMUTH COMPOUNDS; CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); CRYSTALLIZATION; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; GROWTH (MATERIALS); SPUTTERING; SURFACE PROPERTIES; SURFACE ROUGHNESS;

CONDUCTION LOSSES; INTERGROWTH; MULTITARGET SPUTTERING; SURFACE RESISTANCE;

SUPERCONDUCTING FILMS;

EID: 0032682846     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.784901     Document Type: Article

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