Effects of sub-resolution assist features on depth of focus and uniformity of contact windows for 193 nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 630-638

  Kroyan, A ^a   Watson, G P ^a   Cirelli, R A ^a   Nalamasu, O ^a   Tittel, F K ^a  

^a RICE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FOCUSING; MASKS; OPTICAL RESOLVING POWER; OPTIMIZATION;

CONTACT WINDOWS; SOFTWARE PACKAGE PROLITH; SOFTWARE PACKAGE SOLID-C; SUB-RESOLUTION ASSIST FEATURES;

PHOTOLITHOGRAPHY;

EID: 0032680126     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354377     Document Type: Conference Paper

References (3)