New method for reduction of corner undercutting in anisotropic KOH etching, and applications to MEMS and MOEMS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3680, Issue II, 1999, Pages 1091-1098

  Kaou, N ^a   Jeannot, J C ^a   de Labachelerie, M ^a  

^a 32 Av de l'Observ 25044 Cedex   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; MASKS; MICROELECTROMECHANICAL DEVICES; OPTICAL FIBERS; OPTOELECTRONIC DEVICES;

ANISOTROPIC ETCHING; CORNER COMPENSATION METHODS; MICROOPTOELECTROMECHANICAL SYSTEMS (MOEMS);

ETCHING;

EID: 0032680119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (3)