Attenuated phase-shifting mask in ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 324-331

  Miyazaki, Junji ^a   Uematsu, Masaya ^a   Nakazawa, Keisuke ^a   Matsuo, Takahiro ^a   Onodera, Toshio ^a   Ogawa, Tohru ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ERROR ANALYSIS; LIGHT TRANSMISSION; PHASE SHIFT; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICE MANUFACTURE;

ATTENUATION PHASE-SHIFTING MASKS (ATT-PSM); CRITICAL DIMENSION (CD) CONTROL; MASS ERROR FACTOR (MEF);

MASKS;

EID: 0032678934     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360213     Document Type: Conference Paper

References (5)