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Volumn , Issue , 1999, Pages 491-496
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Novel VLSI layout fabric for deep sub-micron applications
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Author keywords
[No Author keywords available]
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Indexed keywords
CAPACITANCE;
ELECTRIC RESISTANCE;
ELECTRIC WIRE;
INTEGRATED CIRCUIT LAYOUT;
DEEP SUBMICRON (DSM) INTEGRATED CIRCUIT DESIGN;
VLSI CIRCUITS;
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EID: 0032678594
PISSN: 0738100X
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Article |
Times cited : (72)
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References (18)
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