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Volumn 201, Issue , 1999, Pages 1028-1031
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Precise growth of high uniformity vertical cavity devices using tunable dynamic optical reflectometry
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
MULTILAYERS;
SEMICONDUCTOR DEVICE STRUCTURES;
TERNARY SYSTEMS;
MICROCAVITY SEMICONDUCTOR DEVICES;
TUNABLE DYNAMIC OPTICAL REFLECTOMETRY (TDOR);
MOLECULAR BEAM EPITAXY;
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EID: 0032678557
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-0248(98)01514-0 Document Type: Article |
Times cited : (9)
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References (9)
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