Develop temperature and process study on a thick film photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue I, 1999, Pages 689-700

  Lehar, Octavia ^a   Jensen, Kathryn ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

THERMOANALYSIS; THICK FILMS;

THICK FILM PHOTORESISTS;

PHOTORESISTS;

EID: 0032678352     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350256     Document Type: Conference Paper

References (9)