Sub 100 nm pattern fabrication using LB resist and e-beam or synchrotron radiation excited plasma

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3676, Issue I, 1999, Pages 333-341

  Phatak, Girish J ^a   Ogawa, Shinji ^a   Harun, Mohd Zalid Bin ^a   Morita, Shinzo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; INTERFACES (MATERIALS); LANGMUIR BLODGETT FILMS; PHOTORESISTS; PLASMA ETCHING; SEMICONDUCTING SILICON; SUBSTRATES; SYNCHROTRON RADIATION;

FINE PATTERN FABRICATIONS; SYNCHROTRON RADIATION EXCITED PLASMA (SREP) ETCHING METHODS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032678337     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.351105     Document Type: Conference Paper

References (10)