Comparative study of resist stabilization techniques for metal etch processing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1126-1135

  Becker, Gerry ^a   Ross, Matthew ^a   Wong, Selmer ^a   Minter, Jason ^a   Marlowe, Trey ^a   Livesay, William R ^a  

^a HONEYWELL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

ELECTRON BEAM STABILIZATION; ETCH SELECTIVITY;

PHOTORESISTS;

EID: 0032677826     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350164     Document Type: Conference Paper

References (2)