Reactive ion etching of quartz and glasses for microfabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3680, Issue II, 1999, Pages 839-847

  Leech, Patrick W ^a   Reeves, Geoffrey K ^a  

^a CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

MICROFABRICATIONS; SPUTTER ETCHING;

COMPOSITION EFFECTS; MICROMACHINING; OPTICAL GLASS; PLASMA INTERACTIONS; QUARTZ; REACTIVE ION ETCHING; SILICA; SUBSTRATES;

INTEGRATED OPTOELECTRONICS;

EID: 0032676694     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (13)