Control of damascene copper processes by cyclic voltammetric stripping

Proceedings of the AESF Annual Technical Conference

Volumn , Issue , 1999, Pages 149-153

  Bratin, Peter ^a   Chalyt, Gene ^a   Pavlov, Michael ^a  

^a ECI Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; COMPOSITION EFFECTS; CYCLIC VOLTAMMETRY; DEFECTS; ELECTROPLATING; ELECTROPLATING SOLUTIONS; PRINTED CIRCUIT MANUFACTURE; PROCESS CONTROL; THROUGHPUT;

CYCLIC VOLTAMMETRIC STRIPPING (CVS) TECHNIQUES; DAMASCENE;

COPPER PLATING;

EID: 0032676568     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (0)