Contrast mechanisms of secondary electron images in scanning electron and ion microscopy

Applied Surface Science

Volumn 144-145, Issue , 1999, Pages 96-100

  Sakai, Y ^a   Yamada, T ^a   Suzuki, T ^a   Ichinokawa, T ^b  

^a JEOL LTD   (Japan)

^b WASEDA UNIVERSITY   (Japan)

Author keywords

Contrast mechanisms; Scanning electron microscopy; Scanning ion microscopy

Indexed keywords

ARGON; ATOMS; GALLIUM; IMAGE PROCESSING; ION BEAMS; ION BOMBARDMENT; METALS; POSITIVE IONS; PROTONS; SCANNING ELECTRON MICROSCOPY;

ATOMIC NUMBER; CONTRAST MECHANISMS; ELECTRON BOMBARDMENT; SCANNING ION MICROSCOPY; SECONDARY ELECTRON IMAGES;

ELECTRONS;

EID: 0032675554     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00773-9     Document Type: Article

References (4)

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3. H.E. Schiøtt, Kgl. Danske Vid. Selsk. Matt-Fys. Medd. 35 (9) (1965) .
4. P.D. Townsend, J.C. Kelly, N.E.W. Hartley, in: Ion Implantation, Sputtering and their Applications, Chap. 2, Academic Press, London, 1976.