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Volumn 46, Issue 7, 1999, Pages 1302-1311

Enhanced transmission line model structures for accurate resistance evaluation of small-size contacts and for more reliable fabrication

Author keywords

[No Author keywords available]

Indexed keywords

TRANSMISSION LINE MODEL (TLM) TECHNIQUES;

EID: 0032675037     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.772468     Document Type: Article
Times cited : (28)

References (11)
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    • J. Pimbley, "Dual-level transmission line model for current flow in metal-semiconductor contacts," IEEE Trans. Electron Devices, vol. ED-33, pp. 1795-1800, Nov. 1986.
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    • Pimbley, J.1
  • 3
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    • A direct measurement of interfacial contact resistance
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    • S. Proctor and L. Linholm, "A direct measurement of interfacial contact resistance," IEEE Electron Device Lett., vol. EDL-3, pp. 294-296, Oct. 1982.
    • (1982) IEEE Electron Device Lett. , vol.EDL-3 , pp. 294-296
    • Proctor, S.1    Linholm, L.2
  • 4
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    • Current crowding on metal contacts to planar devices
    • Dec.
    • H. Murrmann and D. Widmann, "Current crowding on metal contacts to planar devices," IEEE Trans. Electron Devices, vol. ED-16, pp. 1022-1024, Dec. 1969.
    • (1969) IEEE Trans. Electron Devices , vol.ED-16 , pp. 1022-1024
    • Murrmann, H.1    Widmann, D.2
  • 5
    • 0020089025 scopus 로고
    • The effects of contact size and nonzero metal resistance on the determination of specific contact resistance
    • G. S. Marlow and M. B. Das, "The effects of contact size and nonzero metal resistance on the determination of specific contact resistance," Solid-State Electron., vol. 25, no. 2, pp. 91-94, 1982.
    • (1982) Solid-state Electron. , vol.25 , Issue.2 , pp. 91-94
    • Marlow, G.S.1    Das, M.B.2
  • 6
    • 0001672081 scopus 로고
    • Models for contacts to planar devices
    • H. Berger, "Models for contacts to planar devices," Solid-State Electron., vol. 15, p. 145, 1972.
    • (1972) Solid-state Electron. , vol.15 , pp. 145
    • Berger, H.1
  • 7
    • 0029290359 scopus 로고
    • Understanding the sheet resistance parameter of alloyed ohmic contacts using a transmission line model
    • G. K. Reeves, P. W. Leech, and H. B. Harrison, "Understanding the sheet resistance parameter of alloyed ohmic contacts using a transmission line model," Solid-State Electron., vol. 38, no. 4, pp. 745-751, 1995.
    • (1995) Solid-state Electron. , vol.38 , Issue.4 , pp. 745-751
    • Reeves, G.K.1    Leech, P.W.2    Harrison, H.B.3
  • 8
    • 0020129227 scopus 로고
    • Obtaining the specific contact resistance from transmission line model measurements
    • May
    • G. K. Reeves and H. B. Harrison, "Obtaining the specific contact resistance from transmission line model measurements," IEEE Electron Device Lett., vol. EDL-3, pp. 111-113, May 1982.
    • (1982) IEEE Electron Device Lett. , vol.EDL-3 , pp. 111-113
    • Reeves, G.K.1    Harrison, H.B.2
  • 9
    • 0028500089 scopus 로고
    • An improved transmission line structure for contact resistivity measurements
    • L. P. Floyd, T. Scheuermann, P. A. F. Herbert, and W. M. Kelly, "An improved transmission line structure for contact resistivity measurements," Solid-State Electron., vol. 37, no. 9, pp. 1579-1584, 1994.
    • (1994) Solid-state Electron. , vol.37 , Issue.9 , pp. 1579-1584
    • Floyd, L.P.1    Scheuermann, T.2    Herbert, P.A.F.3    Kelly, W.M.4
  • 10
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    • Characterization of planar ohmic contacts - The effect of position of probes on contact area
    • M. Porges and T. Lalinsky, "Characterization of planar ohmic contacts - The effect of position of probes on contact area," Solid-State Electron., vol. 35, no. 2, pp. 157-158, 1992.
    • (1992) Solid-state Electron. , vol.35 , Issue.2 , pp. 157-158
    • Porges, M.1    Lalinsky, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.