Effect of laser-ablation process parameters and post-annealing treatment on ferroelectric PZT thin films

Applied Surface Science

Volumn 142, Issue 1, 1999, Pages 407-412

  Lappalainen, Jyrki ^a   Frantti, Johannes ^a   Lantto, Vilho ^a  

^a UNIVERSITY OF OULU   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION; DEPOSITION; FERROELECTRIC MATERIALS; FILM GROWTH; LASER ABLATION; LASER BEAM EFFECTS; PULSED LASER APPLICATIONS; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

LASER BEAM FLUENCE; LEAD ZIRCONATE TITANATE; POST ANNEALING TREATMENT;

SEMICONDUCTING LEAD COMPOUNDS;

EID: 0032675033     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00711-9     Document Type: Article

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