Performance of the ArF scanning exposure tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 522-529

  Mori, Susumu ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; PHOTORESISTS;

SCANNING EXPOSURE TOOLS;

OPTICAL SYSTEMS;

EID: 0032674684     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354363     Document Type: Conference Paper

References (7)