In situ synchrotron characterization of mechanically activated self-propagating high-temperature synthesis applied in Mo-Si system

Acta Materialia

Volumn 47, Issue 7, 1999, Pages 2113-2123

  Gras, C H ^a,b   Charlot, F ^a,b   Gaffet, E ^a   Bernard, F ^b   Niepce, J C ^b  

^a CNRS   (France)

^b LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

IN SITU COMBUSTION; INFRARED IMAGING; MOLYBDENUM; NANOSTRUCTURED MATERIALS; SILICON; SYNCHROTRONS; SYNTHESIS (CHEMICAL); TEMPERATURE; THERMAL GRADIENTS; WAVES; X RAY DIFFRACTION;

COMBUSTION FRONT; COMBUSTION WAVE; MECHANICAL ACTIVATION; SELF PROPAGATION HIGH TEMPERATURE SYNTHESIS; TIME RESOLVED X RAY DIFFRACTION;

BINARY MIXTURES;

EID: 0032674494     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(99)00084-1     Document Type: Article

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