Atomic layer deposition of ZnO films and their application to solar cells

Solid State Phenomena

Volumn 67, Issue , 1999, Pages 237-247

  Yamada, A ^a   Konagai, M ^a  

^a Tokyo Institute of Technology   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BORON; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY OF SOLIDS; FILM GROWTH; MORPHOLOGY; SILICON SOLAR CELLS; ZINC OXIDE;

ATOMIC LAYER DEPOSITION; TRANSPARENT CONDUCTING OXIDES (TCO);

CONDUCTIVE FILMS;

EID: 0032673158     PISSN: 10120394     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.4028/www.scientific.net/ssp.67-68.237     Document Type: Article

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