4-Probe micropatterning and electrical measurements across individual grain boundaries in electroceramics

Journal of Electroceramics

Volumn 3, Issue 3, 1999, Pages 245-254

  Rodrigues, Richard P ^a   Hwang, Jin Ha ^a   Dravid, Vinayak P ^a  

^a Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEGRADATION; ELECTRIC CURRENT MEASUREMENT; ELECTRIC IMPEDANCE MEASUREMENT; GRAIN BOUNDARIES; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); LITHOGRAPHY; MICROELECTRODES; VARISTORS; VOLTAGE MEASUREMENT; ZINC OXIDE;

CONTACT LITHOGRAPHY; ELECTROCERAMICS; PROJECTION LITHOGRAPHY;

CERAMIC MATERIALS;

EID: 0032671639     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1009977400948     Document Type: Article

References (39)

1. L.M. Levinson (editor) in Grain Boundary Phenomena in Electroceramics, Advances in Ceramics, Vol. 1, (Am. Ceram. Soc., Columbus, OH, 1981). See an excellent reference by D.R. Clarke, J. Am. Ceram. Soc., 82 (3), 485 (1999).
2. L.M. Levinson (editor) in Grain Boundary Phenomena in Electroceramics, Advances in Ceramics, Vol. 1, (Am. Ceram. Soc., Columbus, OH, 1981). See an excellent reference by D.R. Clarke, J. Am. Ceram. Soc., 82 (3), 485 (1999).
3. M.F. Yan and A.H. Heuer (editors) in Character of Grain Boundaries, Advances in Ceramics, Vol. 6, (Am. Cer. Soc., Columbus, OH, 1983).
4. J. Bernasconi, H.P. Klein, B. Knecht, and S. Strassler, J. Electron. Mater., 5, 473 (1976).
5. R. Einzinger, Appl. Surf. Sci., 1, 329 (1978).
6. M. Tao, B. Ai, O. Dorlanne, and A. Loubiere, J. Appl. Phys., 61(4), 1562 (1987).
7. R. Einzinger, Appl. Surf. Sci., 3, 390 (1979).
8. G.D. Mahan, L.M. Levinson, and H.R. Philipp, Appl. Phys. Lett., 33, 830 (1978).
9. H.T. Sun, L.Y. Zhang, and X. Yao, J. Am. Ceram. Soc., 76(5), 1150 (1993).
10. J.T.C. van Kemenade and R.K. Eijnthoven, J. Appl. Phys., 50(2), 938 (1979).
11. J.D. Russell, D.C. Halls, and C. Leach, J. Mater. Sci. Lett., 14(9), 676 (1995).
12. E. Olsson and G.L. Dunlop, J. Appl. Phys., 66(8), 3666 (1989).
13. H. Wang, W. Li, and J.F. Cordaro, Jpn. J. Appl. Phys., 34(1-4A), 1765 (1995).
14. N. Wakiya, H. Sumino, K. Shinozaki, and N. Mizutani, J. Ceram. Soc. Jpn., 99(9), 788 (1991).
15. Y.-M. Chiang, W.D. Kingery, and L.M. Levinson, J. Appl. Phys., 53, 1765 (1982).
16. J. Fleig and J. Maier, Solid State Ionics, 85, 9 (1996).
17. L.F. Lou, J. Appl. Phys., 50(1), 555 (1979).
18. U. Schwing and B. Hoffmann, J. Appl. Phys., 57(12), 5372 (1985).
19. M. Matsuoka, Jpn. J. Appl. Phys., 10(6), 736 (1971).
20. K. Eda, J. Appl. Phys., 49(5), 2964 (1978).
21. L.M. Levinson and H.R. Philipp, J. Appl. Phys., 46, 1332 (1975).
22. L.M. Levinson and H.R. Philipp, J. Appl. Phys., 46, 3206 (1975).
23. L.M. Levinson and H.R. Philipp, J. Solid State Chem., 12, 292 (1975).
24. K. Eda, IEEE Electrical Insulation Mag., 5(6), 28 (1989).
25. T.K. Gupta, W.O. Carlson, and P.L. Hower, J. Appl. Phys., 52, 4104 (1981).
26. M. Hayashi, M. Haba, S. Hirano, M. Okamoto, and M. Watanabe, J. Appl. Phys., 53, 5754 (1982).
27. J. Fan and R. Freer, J. Mater. Sci., 28(5), 1391 (1993).
28. N.H. Tri, B. Al, and A. Loubiere, J. Phys. D: Appl. Phys, 28(8), 1723 (1995).
29. S.N. Bai and T.Y. Tseng, J. Am. Ceram. Soc., 78(10), 2685 (1995).
30. H.F. Li, Y.C. Xu, S.L. Wang, and L.Q. Wang, J. Mater. Sci., 30(20), 5161 (1995).
31. E.R. Leite, J.A. Varela, and E. Longo, J. Appl. Phys., 72(1), 147 (1992).
32. A. Bui, K. Alabdullah, A. Loubiere, M. Tao, and Q.C. Nguyen, J. Phys. D: Appl. Phys., 24(5), 757 (1991).
33. R. Einzinger, Ann. Rev. Mater. Sci., 17, 299 (1987).
34. K. Eda, A. Iga, and M. Matsuoka, J. Appl. Phys., 51, 2678 (1980).
35. H.R. Philipp and L.M. Levinson, in Advances in Electronic Ceramics, Vol. 7, edited by M.F. Yan and A.H. Heuer (Am. Ceram. Soc., Columbus, OH, 1983), p. 1.
36. T.K. Gupta, W.G. Carlson, and P.L. Hower, J. Appl. Phys., 52, 4104 (1981).
37. M. Hayashi, M. Haba, S. Hirano, M. Okamoto, and M. Watanabe, J. Appl. Phys., 53, 5754 (1982).
38. F. Stucki, P. Bruesch, and F. Greuter, Surface Sci., 189/190, 294 (1987).
39. K. Sato, Y. Tanaka, T. Takemura, and M. Otatake, J. Appl. Phys., 53, 8819 (1982).