Off-axis electron holography of nearly-spherical faceted voids in self-annealed implanted silicon

Materials Characterization

Volumn 42, Issue 4, 1999, Pages 241-247

  Beeli, C ^a   Matteucci, G ^b   Lulli, G ^c   Merli, P G ^c   Migliori, A ^c  

^a EPFL   (Switzerland)

^b UNIVERSITY OF BOLOGNA   (Italy)

^c CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HOLOGRAPHY; IMAGE RECONSTRUCTION; ION IMPLANTATION; POINT DEFECTS;

NEARLY-SPHERICAL FACETED VOIDS; OFF-AXIS ELECTRON HOLOGRAPHY; SELF-ANNEALED IMPLANTED SILICON;

SILICON WAFERS;

EID: 0032671343     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1044-5803(99)00018-2     Document Type: Article

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