New synthetic method of forming aluminum oxynitride by plasma arc melting

Journal of the American Ceramic Society

Volumn 82, Issue 6, 1999, Pages 1381-1387

  Fukuyama, Hiroyuki ^a   Nakao, Wataru ^a   Susa, Masahiro ^a   Nagata, Kazuhiro ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EVAPORATION; LATTICE CONSTANTS; MATHEMATICAL MODELS; MELTING; NANOSTRUCTURED MATERIALS; PHASE DIAGRAMS; PLASMA APPLICATIONS; PLASMA ARC MELTING; SYNTHESIS (CHEMICAL); TEMPERATURE;

ALUMINUM OXYNITRIDE; THERMAL PLASMA;

ALUMINUM COMPOUNDS;

EID: 0032670918     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1999.tb01927.x     Document Type: Article

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